Use it to form metal thin film on the surface of sample which is non-conductive or which has got weak conductivity.
When it is necessary to analyze the image or components using a scanning electron microscope (SEM), the image distortion occurs due to charge-up phenomenon of non-conductive objects, making normal measurement is difficult. Since the image is distorted due to the accumulation of charged particles on the surface of the non-conductive sample by the electron beam, the sputtering (coating) process must be performed.
The Ion Sputtering Coater is an essential pre-treatment equipment of sample for SEM with competitiveness in miniaturization, convenient use and low cost.
Use it to form metal thin film on the surface of sample which is non-conductive or which has got weak conductivity.
When it is necessary to analyze the image or components using a scanning electron microscope (SEM), the image distortion occurs due to charge-up phenomenon of non-conductive objects, making normal measurement is difficult. Since the image is distorted due to the accumulation of charged particles on the surface of the non-conductive sample by the electron beam, the sputtering (coating) process must be performed.
The Ion Sputtering Coater is an essential pre-treatment equipment of sample for SEM with competitiveness in miniaturization, convenient use and low cost.
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Ion Sputter Coater
Vacuum Pump - " Oil Rotary Pump " - optional
Coating Material " Au or Pt "
Accessory - " Manual, Hose, Cable "
Technical Features
Model
G20
Degree of Vacuum
2.0 x 10-1Torr
Ion Current
1 to 10mA (1mA/step)
Target Material
Au or Pt
Chamber Size
140mm(D) x 100mm(H)
Sample Stage
50mm(D) x 30mm(H)
Target Size
50mm(D)
Sputter Time
1 to 600sec (1sec/step)
Vacuum Pump
100L/min, Rotary Pump
Power
110~220VAC ±10%, 50/60Hz
Dimension
Main : 380(W)x240(D)x250(H)mm, 10kg
Pump : 454(W)x170(D)x240(H)mm, 23kg