Sheet Resistance Mapping
Filmetrics R-Series resistivity mapping tools marry the sheet resistance technology developed and perfected by KLA for over 45 years with the benchtop instrument technology and user interface refined over the last 20 years by the Filmetrics team.
The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces. These techniques support a wide range of measurements, including but not limited to the following:
- Metal film and backside layer thickness measurements
- Substrate resistivity
- Sheet resistance
- Thin film thickness or resistivity
- Sheet conductivity
- Bulk conductivity
The Filmetrics R50 resistivity mapping system design is optimized to support a wide range of sample types with extended clearance and automated sample point mapping using rectangular, linear, polar and custom configurations.
The KLA Instruments™ R54-Series systems offers the measurement performance of the R50 inside a light-tight enclosure with additional functionality to support automated X-Y-θ stages for full 200mm or 300mm wafer mapping of semiconductor and compound semiconductor wafers
