Filmetrics R-Series resistivity mapping tools marry the sheet resistance technology developed and perfected by KLA for over 45 years with the benchtop instrument technology and user interface refined over the last 20 years by the Filmetrics team.
The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces. These techniques support a wide range of measurements, including but not limited to the following:
- Metal film and backside layer thickness measurements
- Substrate resistivity
- Sheet resistance
- Thin film thickness or resistivity
- Sheet conductivity
- Bulk conductivity
The Filmetrics R50 resistivity mapping system design is optimized to support a wide range of sample types with extended clearance and automated sample point mapping using rectangular, linear, polar and custom configurations.
The KLA Instruments™ R54-Series systems offers the measurement performance of the R50 inside a light-tight enclosure with additional functionality to support automated X-Y-θ stages for full 200mm or 300mm wafer mapping of semiconductor and compound semiconductor wafers.
Files
| Attachment | Size |
|---|---|
 R50 Series Resistivity Mapper | 1.24 MB |
The Filmetrics R50-4PP contact four-point probe system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The 10-decade measurement capability and large Z range make the R50-4PP ideal for a wide variety of applications.
The Filmetrics R50-200-4PP is also available to accommodate larger sample sizes.
The Filmetrics R50-EC non-contact eddy current system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The non-contact eddy current sheet resistance measurement is ideal for measuring resistance and film thickness on sensitive and/or flexible conductive surfaces.
The Filmetrics R50-200-EC is also available to accommodate larger sample sizes.
The Filmetrics R54-200 advanced sheet resistance and conductivity mapping systems deliver R50 performance capability within a light-tight enclosure with additional capability to support semiconductor and compound semiconductor applications, including implant and epitaxial wafers.
The Filmetrics R54-200 can be configured as either direct four-point probe (R54-200-4PP) or non-contact eddy current system (R54-200-EC).
The Filmetrics R54-300 advanced sheet resistance mapping system configuration maintains the small footprint of the 200mm system by employing a high precision X-Y-θ stage for superior edge exclusion and high-density mapping. The R54-300 delivers process optimization metrology in a compact benchtop package.
The Filmetrics R54-300 can be configured as either direct four-point probe (R54-300-4PP) or non-contact eddy current (R54-300-EC).
Technical Features
Model | Sensor Type | Measurement Range | Maximum Map Diameter | XY Stage Range | Maximum Sample Height |
|---|---|---|---|---|---|
R50-4PP | Contact 4PP | 1mΩ/sq - | 100mm | 100mm x | 100mm |
R50-EC | Non-contact | 1mΩ/sq - | 100mm | 100mm x | 100mm |
R50-200-4PP | Contact 4PP | 1mΩ/sq - | 200mm | 200mm | 100mm |
R50-200-EC | Non-contact | 1mΩ/sq - | 200mm | 200mm | 100mm |
R54-200-4PP | Contact 4PP | 1mΩ/sq - | 200mm | 200mm x | 15mm |
R54-200-EC | Non-contact | 1mΩ/sq - | 200mm | 200mm x | 15mm |
R54-300-4PP | Contact 4PP | 1mΩ/sq - | 300mm | 300mm | 15mm |
R54-300-EC | Non-contact | 1mΩ/sq - | 300mm | 300mm | 15mm |
*Automated X-Y-θ stages