G10

Ion Sputter Coater - For your SEM
G10 applies vacuum environment inside of a chamber and coat (via gold deposition) the surface of a non conductive sample by Ion released from a Gold target, by plasma discharge at low-voltage.
The aim is to make conductive the surface of a sample which is non-conductive or has got weak conductivity, forming a metal thin film.
Platin (Pt) deposition is available too, and also electrode connection (conductivity increase test); both are also used as sample pre-treatment equipment for SEM.
We can provide Ion Sputtering Coaters, an essential pre-treatment equipment for SEM samples; key feature are miniaturization, easy-to-use and budget price.

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Ion Sputtering Coater (Model G10)
Component of Equipment

Ion Sputter Coater

  • Tempered Glass for Chamber (Detachable)
  • Ultra-light weight coater (10kg)
  • Convenient service by BOARD composing for each function

Vacuum Pump - " Oil Rotary Pump " - optional

  • Pumping Speed : 100L/min 

Coating Material " Au or Pt "

  • Au(4N) : 50mm(D)
  • Pt(3N5) : 50mm(D)
  • Gold target provided

Accessory - " Manual, Hose, Cable "

  • Manual (Install/Quick Guide)
  • Clamp
  • 1.5M Vacuum Hose
  • Power Cable
Functions

Button Description

  1. Power : Equipment’s Main Power Switch
  2. LOW : 20sec Coating (Coating Thinkness : ±15nm)
  3. MEDIUM : 40sec Coating (Coating Thinkness : ±23nm)
  4. HIGH : 60sec Coating (Coating Thinkness : ±30nm) /li>

Coating Process

  1. Push the Power button, G10 model’s operatoin power supplying.
  2. User can choose among LOW, MEDIUM, HIGH mode and automatically make vacuum set and Ion Plasma sputtering within 2 minutes.
  3. After the coating, vacuum vented automatically and can check result.
Coating Thickness

Technical Features

  1. Automated Coating by one button click
  2. Fast and simple Coater: put the sample in the chamber and coat it just by pushing the Start Button
  3. Time of procedure completion: within 2 min. from start to Coating
  4. Set Coating conditions: 3 steps (20, 40, 60sec)
  5. 7 pieces of Sample Stub (Φ14㎜) mounting together in chamber
  6. Minimized installation space thanks to the compact size

Model

G10

Ion Current

38mA (Fixed)

Target Material

Au or Pt

Chamber Size

140mm(D) x 70mm(H)

Sample Stage

50mm(D) x 25mm(H)

Target Size

50mm(D)

Sputter Time

20sec, 40sec, 60sec (3steps)

Vacuum Pump

100L/min, Rotary Pump

Power

220VAC ±10%, 50/60Hz

Dimension

Main : 380(W)x240(D)x235(H)mm, 10kg
Pump : 454(W)x170(D)x240(H)mm, 23kg