G10 applies vacuum environment inside of a chamber and coat (via gold deposition) the surface of a non conductive sample by Ion released from a Gold target, by plasma discharge at low-voltage.
The aim is to make conductive the surface of a sample which is non-conductive or has got weak conductivity, forming a metal thin film. Platin (Pt) deposition is available too, and also electrode connection (conductivity increase test); both are also used as sample pre-treatment equipment for SEM.
We can provide Ion Sputtering Coaters, an essential pre-treatment equipment for SEM samples; key feature are miniaturization, easy-to-use and budget price.
Platin (Pt) deposition is available too, and also electrode connection (conductivity increase test); both are also used as sample pre-treatment equipment for SEM.
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Ion Sputter Coater
Vacuum Pump - " Oil Rotary Pump " - optional
Coating Material " Au or Pt "
Accessory - " Manual, Hose, Cable "
Button Description
Coating Process
Technical Features
Model
G10
Ion Current
38mA (Fixed)
Target Material
Au or Pt
Chamber Size
140mm(D) x 70mm(H)
Sample Stage
50mm(D) x 25mm(H)
Target Size
50mm(D)
Sputter Time
20sec, 40sec, 60sec (3steps)
Vacuum Pump
100L/min, Rotary Pump
Power
220VAC ±10%, 50/60Hz
Dimension
Main : 380(W)x240(D)x235(H)mm, 10kg
Pump : 454(W)x170(D)x240(H)mm, 23kg