Ion Sputter Coater - For your SEM
Category:
G10 applies vacuum environment inside of a chamber and coat (via gold deposition) the surface of a non conductive sample by Ion released from a Gold target, by plasma discharge at low-voltage.
The aim is to make conductive the surface of a sample which is non-conductive or has got weak conductivity, forming a metal thin film.
Platin (Pt) deposition is available too, and also electrode connection (conductivity increase test); both are also used as sample pre-treatment equipment for SEM.
Platin (Pt) deposition is available too, and also electrode connection (conductivity increase test); both are also used as sample pre-treatment equipment for SEM.
We can provide Ion Sputtering Coaters, an essential pre-treatment equipment for SEM samples; key feature are miniaturization, easy-to-use and budget price.
Videos
Component of Equipment
Ion Sputter Coater
- Tempered Glass for Chamber (Detachable)
- Ultra-light weight coater (10kg)
- Convenient service by BOARD composing for each function
Vacuum Pump - " Oil Rotary Pump " - optional
- Pumping Speed : 100L/min
Coating Material " Au or Pt "
- Au(4N) : 50mm(D)
- Pt(3N5) : 50mm(D)
- Gold target provided
Accessory - " Manual, Hose, Cable "
- Manual (Install/Quick Guide)
- Clamp
- 1.5M Vacuum Hose
- Power Cable
Functions
Button Description
- Power : Equipment’s Main Power Switch
- LOW : 20sec Coating (Coating Thinkness : ±15nm)
- MEDIUM : 40sec Coating (Coating Thinkness : ±23nm)
- HIGH : 60sec Coating (Coating Thinkness : ±30nm) /li>
Coating Process
- Push the Power button, G10 model’s operatoin power supplying.
- User can choose among LOW, MEDIUM, HIGH mode and automatically make vacuum set and Ion Plasma sputtering within 2 minutes.
- After the coating, vacuum vented automatically and can check result.
Technical Features
- Automated Coating by one button click
- Fast and simple Coater: put the sample in the chamber and coat it just by pushing the Start Button
- Time of procedure completion: within 2 min. from start to Coating
- Set Coating conditions: 3 steps (20, 40, 60sec)
- 7 pieces of Sample Stub (Φ14㎜) mounting together in chamber
- Minimized installation space thanks to the compact size
Model | G10 |
---|---|
Ion Current | 38mA (Fixed) |
Target Material | Au or Pt |
Chamber Size | 140mm(D) x 70mm(H) |
Sample Stage | 50mm(D) x 25mm(H) |
Target Size | 50mm(D) |
Sputter Time | 20sec, 40sec, 60sec (3steps) |
Vacuum Pump | 100L/min, Rotary Pump |
Power | 220VAC ±10%, 50/60Hz |
Dimension | Main : 380(W)x240(D)x235(H)mm, 10kg |