Synthetic Diamond: New Frontier in Power Electronics. Why Nanometer-Scale Metrology is Critical to Avoid Growth Defects

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Synthetic Diamond: New Frontier in Power Electronics. Why Nanometer-Scale Metrology is Critical to Avoid Growth Defects
Post publication date: 
Friday, July 25, 2025

Synthetic diamond is shaping the future of renewable energy and power electronics.
This sentence perfectly sums up the importance of this revolutionary material in next-generation technologies.

As performance requirements grow more demanding—in electric vehicles, energy storage systems, and high-voltage conversion—synthetic diamond has emerged as a leading candidate for high-efficiency, high-reliability electronic devices.

But here’s the challenge: even the smallest defect during diamond growth can compromise performance. That’s why structural integrity must be verified at the micrometer or nanometer scale.

With optical interferometry, manufacturers can:

  • Capture the finest surface details

  • Measure high aspect ratios and steep slopes

  • Minimize measurement errors in complex geometries

This is where Sensofar’s 3D optical metrology systems play a crucial role.

Documents and Files 

AttachmentSize
PDF icon Semiconductor Manufacturing – End-to-End Metrology Strategies for QC7.76 MB
From Crystal to Circuit: Bridging Synthetic Diamond with Semiconductor Manufacturing

The connection between synthetic diamond and semiconductor manufacturing is natural and increasingly vital. As highlighted in Sensofar’s white paper “Semiconductor Manufacturing – End-to-End Metrology Strategies for QC,” modern semiconductor processes rely on:

  • Ultra-flat, defect-free substrates
  • Non-contact surface inspection at nanometric resolution
  • Tight process control over advanced materials

These are exactly the same challenges faced when working with synthetic diamond.

In fact, Sensofar’s Coherence Scanning Interferometry (CSI) technology is already used to:

  • Monitor diamond growth morphology

  • Assess surface flatness and roughness at the nanometer scale

  • Verify uniformity of diamond substrates before integration into chips

The tools that have revolutionized silicon wafer metrology—S neox, S mart 2, and SensoPRO—are now proving equally effective with diamond, SiC, GaN, and other third-generation semiconductors.

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