Filmetrics R-Series resistivity mapping tools marry the sheet resistance technology developed and perfected by KLA for over 45 years with the benchtop instrument technology and user interface refined over the last 20 years by the Filmetrics team.
The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces. These techniques support a wide range of measurements, including but not limited to the following:
Metal film and backside layer thickness measurements
Substrate resistivity
Sheet resistance
Thin film thickness or resistivity
Sheet conductivity
Bulk conductivity
The Filmetrics R50 resistivity mapping system design is optimized to support a wide range of sample types with extended clearance and automated sample point mapping using rectangular, linear, polar and custom configurations.
The KLA Instruments™ R54-Series systems offers the measurement performance of the R50 inside a light-tight enclosure with additional functionality to support automated X-Y-θ stages for full 200mm or 300mm wafer mapping of semiconductor and compound semiconductor wafers.
The Filmetrics R50-4PP contact four-point probe system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The 10-decade measurement capability and large Z range make the R50-4PP ideal for a wide variety of applications. The Filmetrics R50-200-4PP is also available to accommodate larger sample sizes.
Filmetrics R50-EC
The Filmetrics R50-EC non-contact eddy current system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The non-contact eddy current sheet resistance measurement is ideal for measuring resistance and film thickness on sensitive and/or flexible conductive surfaces.
The Filmetrics R50-200-EC is also available to accommodate larger sample sizes.
Filmetrics R54-200
The Filmetrics R54-200 advanced sheet resistance and conductivity mapping systems deliver R50 performance capability within a light-tight enclosure with additional capability to support semiconductor and compound semiconductor applications, including implant and epitaxial wafers.
The Filmetrics R54-200 can be configured as either direct four-point probe (R54-200-4PP) or non-contact eddy current system (R54-200-EC).
Filmetrics R54-300
The Filmetrics R54-300 advanced sheet resistance mapping system configuration maintains the small footprint of the 200mm system by employing a high precision X-Y-θ stage for superior edge exclusion and high-density mapping. The R54-300 delivers process optimization metrology in a compact benchtop package.
The Filmetrics R54-300 can be configured as either direct four-point probe (R54-300-4PP) or non-contact eddy current (R54-300-EC).
Filmetrics R-Series resistivity mapping tools marry the sheet resistance technology developed and perfected by KLA for over 45 years with the benchtop instrument technology and user interface refined over the last 20 years by the Filmetrics team.
The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces. These techniques support a wide range of measurements, including but not limited to the following:
The Filmetrics R50 resistivity mapping system design is optimized to support a wide range of sample types with extended clearance and automated sample point mapping using rectangular, linear, polar and custom configurations.
The KLA Instruments™ R54-Series systems offers the measurement performance of the R50 inside a light-tight enclosure with additional functionality to support automated X-Y-θ stages for full 200mm or 300mm wafer mapping of semiconductor and compound semiconductor wafers.
Files
Application Fields
The Filmetrics R50-4PP contact four-point probe system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The 10-decade measurement capability and large Z range make the R50-4PP ideal for a wide variety of applications.
The Filmetrics R50-200-4PP is also available to accommodate larger sample sizes.
The Filmetrics R50-EC non-contact eddy current system maps metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity. The non-contact eddy current sheet resistance measurement is ideal for measuring resistance and film thickness on sensitive and/or flexible conductive surfaces.
The Filmetrics R50-200-EC is also available to accommodate larger sample sizes.
The Filmetrics R54-200 advanced sheet resistance and conductivity mapping systems deliver R50 performance capability within a light-tight enclosure with additional capability to support semiconductor and compound semiconductor applications, including implant and epitaxial wafers.
The Filmetrics R54-200 can be configured as either direct four-point probe (R54-200-4PP) or non-contact eddy current system (R54-200-EC).
The Filmetrics R54-300 advanced sheet resistance mapping system configuration maintains the small footprint of the 200mm system by employing a high precision X-Y-θ stage for superior edge exclusion and high-density mapping. The R54-300 delivers process optimization metrology in a compact benchtop package.
The Filmetrics R54-300 can be configured as either direct four-point probe (R54-300-4PP) or non-contact eddy current (R54-300-EC).
Technical Features
Model
Sensor Type
Measurement Range
Maximum Map Diameter
XY Stage Range
Maximum Sample Height
R50-4PP
Contact 4PP
1mΩ/sq -
200MΩ/sq
100mm
100mm x
100mm
100mm
R50-EC
Non-contact
eddy current
1mΩ/sq -
50Ω/sq
100mm
100mm x
100mm
100mm
R50-200-4PP
Contact 4PP
1mΩ/sq -
200MΩ/sq
200mm
200mm
round
100mm
R50-200-EC
Non-contact
eddy current
1mΩ/sq -
50Ω/sq
200mm
200mm
round
100mm
R54-200-4PP
Contact 4PP
1mΩ/sq -
200MΩ/sq
200mm
200mm x
200mm
15mm
R54-200-EC
Non-contact
eddy current
1mΩ/sq -
50Ω/sq
200mm
200mm x
200mm
15mm
R54-300-4PP
Contact 4PP
1mΩ/sq -
200MΩ/sq
300mm
300mm
round*
15mm
R54-300-EC
Non-contact
eddy current
1mΩ/sq -
50Ω/sq
300mm
300mm
round*
15mm
*Automated X-Y-θ stages