Ion Sputtering Gun
Brand:
Category:
The Model IG70-XY-DP is a high-precision ion source, designed to offer maximum flexibility and control thanks to its system of exchangeable apertures. This feature allows the ion beam to be tailored to the user's specific needs, ensuring optimal performance across various applications.
Key Features
- Exchangeable apertures for ion beam adjustment
- Wide energy range for versatile use
- High beam stability and coherence
- Low outgassing, ideal for high-vacuum environments
- XY configuration for precise positioning
Applications include spectroscopy and surface analysis, controlled sputtering and material modifications, sample preparation and characterization, as well as applications in condensed matter physics and nanotechnology.
Thanks to its precision, modularity, and reliability, it represents an excellent solution for research laboratories and industries that require advanced control in ion-based applications.
Files
| Attachment | Size |
|---|---|
 _ion_sputter_gun_IG70-XY-DP_brochure.pdf | 3.21 MB |
Technical Features
-
- Energy range: from 0 to 5 keV.
- Beam current: up to 15 µA.
- Beam size: adjustable through exchangeable apertures, with diameters ranging from 2 to 20 mm.
- Beam deflection: X-Y deflection system for ion beam rastering.
- Operating pressure: works at low gas pressures, in the range of 10⁻⁶ – 10⁻⁷ Torr.
- Gas types: noble and reactive gases.
- Mounting: CF flange 2.75" (70 mm outer diameter).
- Bakeability: up to 250°C under vacuum.
- Dimensions: lens diameter of 29 mm and drift tube length variable from 20 to 100 mm.