G5

Ultra-small / low-end Ion Sputter Coater

This equipment uses a magnetic plasma discharge to release ions from a gold target, which are then deposited onto the surface of the sample as a thin coating.

The system is fully automated, allowing the entire process—vacuum generation, plasma coating, and venting—to be performed with a single button. Three coating modes are available: 20 seconds (LOW), 40 seconds (MEDIUM), and 60 seconds (HIGH). Once the preset vacuum level is reached, the plasma discharge starts automatically.

Thanks to its compact design, the equipment requires minimal installation space and can be easily relocated within a few minutes. It provides a coating area of approximately Ø50 mm and features Z-axis adjustment, allowing samples up to 30 mm in height to be positioned and adjusted as required.

Simple, User-Friendly GSEM Coater

  • Fully automated operation with a single button
  • Intuitive controls designed for quick and easy use, even for first-time users

Essential Features at an Affordable Price

  • Focused on the core functions required for ion sputtering
  • Unnecessary and rarely used features have been removed to reduce costs and provide a more competitive price

Ultra-Compact Design for Efficient Space Utilization

  • Quick installation in approximately 5 minutes using a standard 220 V power supply
  • Compact enough for installation inside a glove box
  • Lightweight design of approximately 8 kg allows easy relocation and flexible positioning

Videos

Introducing the highly versatile sputter coater (G5)

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Functions

Ultra-small / low-end Ion Sputter Coater

  • G5 is the best product for using tungsten(W) SEM equipment such as Tabletop-SEM and Normal-SEM.
  • The small-sized G5 is an economical model that minimizes the burden of purchasing cost, and operational management costs are also low.
 

Automatic completion of the entire process

  • Automatic control of coating current up to 50mA
  • Applying Φ35mm Pt target (50mm area coating)
  • Up to 7 pieces at the same time based on Φ14mm Sample Stub
 

From installation to usage training, just 10min!

  • Installation is completed within 5 minutes, including main power, vacuum pump power, and vacuum hose fastening, and only one of the three buttons of Low (20 sec), Medium (40 sec) and High (60 sec) is pressed to complete the coating from vacuum formation, and all work processes are automated.
 

Compact configurations and high space utilization

  • Designed with a magnetron method, the G5 can coat conductive samples in a short time without thermal damage. It can be installed in a minimum space, weighs 8kg and is free to previously install, and the consumables are all platinum targets.

Technical Features

Specifications

Types of Sputtering

Diode discharge magnetron type

Working Vacuum

1.0 to 2.0x10-1 torr

Vacuum times

About 2 minutes

Ion Current

Max. 50mA

Target material

Pt (Included) *Option: Au/Ag/Pd

Target size

Φ35mm(Dia)

Chamber Size

Φ96mm(D) x 91mm(H)

Stage (W/D)

Φ50mm(D) x 30mm(H)

Pump

Rotary: 5CFM (142L/min)

Coating Time

Low(20sec), Medium(40sec), High(60sec) / 3 modes

Dimension / Weight

Main: 266(W)x230(D)x254(H)mm, 8kg; Pump: 338(W)x138(D)x244(H)mm, 10.4kg

Power

Main: 110~220VAC ±10%, 50~60Hz; Pump: 220VAC ±10% (only)